Crystalline High-k Dielectric Films on Atmospheric Plasma Treated Graphene by Atomic Layer Deposition Presentation: Jeong Woo Shin, Seoul National University of Science and Technology, Republic of Korea, 14 min 7 sec
Physical, Chemical, and Electrical Properties of Molecular Layer Deposited Alucone Thin Films using Trimethyl-aluminum and Hydroquinone Presentation: Seung-Hwan Lee, Hanyang University, Republic of Korea, 16 min 1 sec
Achieving Room Temperature and Below Phase Transitions in ALD Doped VO2 Films Presentation: Virginia Wheeler, U.S. Naval Research Laboratory, 17 min 41 sec
Ozone Based High Temperature Atomic Layer Deposition of SiO2 Thin Films Presentation: Su Min Hwang, The University of Texas at Dallas, 14 min 38 sec
Atomic Layer Deposition of High-Tc Magnesium Diboride (MgB2) Film for Superconducting Radio-Frequency Particle Beam Accelerators Presentation: Alireza Nassiri, Argonne National Laboratory, 16 min 32 sec
Commerical Production of ALD-Coated Powders and Polymers Presentation: Daniel Higgs, ALD NanoSolutions, Inc., 16 min 22 sec
Ruthenium: Advanced Nodes and Supply Chain Implications Presentation: Oliver Briel, Umicore AG & Co. KG, Germany, 15 min 1 sec
An Alternative Precursor for Safe Deposition of Aluminum Oxide Thin Films Presentation: Liao Cao, Ghent University, Belgium, 20 min 11 sec
Application of PEALD Technique to the Fabrication of Vertical TFT for the Ultra High-Resolution Display Presentation: Kwang-Heum Lee, Korea Advanced Institute of Science and Technology, Republic of Korea, 21 min 58 sec
Effect of Substrate on MoS2 Deposited by Plasma-enhanced Atomic Layer Deposition Presentation: Asad Mughal, The Pennsylvania State University, 16 min 53 sec
Single-crystal Ternary Perovskite YAlO3 Epitaxial Growth on GaAs and GaN via Y2O3 Template Overcoming a Large Film/Substrate Lattice Mismatch Presentation: L. Bo-Yu Young, National Taiwan University, Republic of China, 13 min 8 sec
Role of Low and Medium Energy Ions in PEALD Processes Presentation: Marceline Bonvalot, LTM-UGA, France, 20 min 55 sec
Energetic Ions during Plasma ALD and their Role in Tailoring Material Properties Presentation: Tahsin Faraz, Eindhoven University of Technology, Netherlands, 17 min 55 sec
Effect of Oxygen Plasma and Growth Temperature on the Densification of Plasma-Enhanced Atomic Layer Deposited Silicon Dioxide Film Presentation: Donghyuk Shin, Yonsei University, Republic of Korea, 12 min 16 sec
On the Co-reactant for Atomic Layer Deposition of Metals: Hydrogen/Nitrogen-based Plasmas for Cobalt ALD Presentation: Martijn Vos, Eindhoven University of Technology, Netherlands, 17 min 11 sec
Plasma-enhanced Atomic Layer Deposition of Tungsten Films using Tungsten Chloride Precursor Presentation: Seunggi Seo, Yonsei University, Republic of Korea, 15 min 13 sec
Tailoring Molybdenum Carbide Properties by Plasma and Ion Energy Control during Plasma Enhanced ALD Presentation: Eldad Grady, Eindhoven University of Technology, Netherlands, 17 min 19 sec
Atmospheric-Pressure Plasma-Enhanced Spatial ALD of In<sub>2</sub>O<sub>3</sub>:H Presentation: Yves Creyghton, Holst Centre - TNO, Netherlands, 17 min 15 sec
Low-Temperature Plasma-Enhanced ALD of Highly Conductive Niobium Nitride Thin Films with RF Substrate Biasing Presentation: Yi Shu, Oxford Instruments Plasma Technology, 19 min 59 sec
Improved Deposition Rate of Low T PEALD Silicon Nitride Using Amines Presentation: Sungsil Cho, Entegris Inc., Republic of Korea, 14 min 48 sec
Improved Adhesion and Electrical Properties of Plasma-Enhanced ALD Platinum through Cycle-by-Cycle Hydrogen Plasma Treatment Presentation: Martin Winterkorn, Stanford University, 16 min 25 sec
Low Temperature SiNx Film Deposition by Plasma Enhanced Atomic Layer Deposition with Trisilylamine Presentation: Sun Jung Kim, Sungkyunkwan University (SKKU), Republic of Korea, 17 min 53 sec
In Situ IR Spectroscopic Investigation of Thermal and Plasma-Enhanced ALD of Pt: Temperature Dependency of the Growth Rate Presentation: Michiel Van Daele, Ghent University, Belgium, 15 min 59 sec
Growth Mechanisms and Diffusion Behavior of Molecular Layer Deposition Films Deposited by Cyclic Azasilanes, Maleic Anhydride, and Water Presentation: Ling Ju, Lehigh University, 15 min 57 sec
In-situ RAIRS Investigation of the Oxidation and Reduction of Cu using O3 and Ethanol Presentation: Luis Fabián Peña, The University of Texas at Dallas, 13 min 36 sec